Invention Grant
- Patent Title: Two-port SRAM cell structure for vertical devices
- Patent Title (中): 用于垂直设备的双端口SRAM单元结构
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Application No.: US14690068Application Date: 2015-04-17
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Publication No.: US09362292B1Publication Date: 2016-06-07
- Inventor: Jhon Jhy Liaw
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L27/11 ; H01L27/092

Abstract:
Two-Port SRAM cells are described. In an embodiment, a cell includes first, second, and read-port pull-down, first and second pull-up, first, second, and read-port pass-gate transistors. Each transistor includes a first source/drain region in an active area, a channel extending above the active area, and a second source/drain region above the channel. First source/drain regions of pull-down transistors are electrically coupled through a first active area. First source/drain regions of pull-up transistors are electrically coupled through a second active area. A first gate electrode is around channels of the first pull-up, first pull-down, and read-port pull-down transistors. A second gate electrode is around the channels of the second pull-up and pull-down transistors. Second source/drain regions of the first pull-up, pull-down, and pass-gate transistors are electrically coupled to the second gate electrode. Second source/drain regions of the second pull-up, pull-down, and pass-gate transistors are electrically coupled to the first gate electrode.
Information query
IPC分类: