Invention Grant
- Patent Title: Solid-state imaging device and manufacturing method thereof
- Patent Title (中): 固态成像装置及其制造方法
-
Application No.: US13289086Application Date: 2011-11-04
-
Publication No.: US09362321B2Publication Date: 2016-06-07
- Inventor: Kazuichiro Itonaga
- Applicant: Kazuichiro Itonaga
- Applicant Address: JP Tokyo
- Assignee: SONY CORPORATION
- Current Assignee: SONY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Michael Best & Friedrich LLP
- Priority: JP2007-148642 20070604
- Main IPC: H01L31/062
- IPC: H01L31/062 ; H01L31/113 ; H01L27/146 ; H01L31/0352

Abstract:
A solid-state imaging device includes a photoelectric conversion unit, a transistor, and an element separation region separating the photoelectric conversion unit and the transistor. The photoelectric conversion unit and the transistor constitute a pixel. The element separation region is formed of a semiconductor region of a conductivity type opposite to that of a source region and a drain region of the transistor. A part of a gate electrode of the transistor protrudes toward the element separation region side beyond an active region of the transistor. An insulating film having a thickness substantially the same as that of a gate insulating film of the gate electrode of the transistor is formed on the element separation region continuing from a part thereof under the gate electrode of the transistor to a part thereof continuing from the part under the gate electrode of the transistor.
Public/Granted literature
- US20120049254A1 SOLID-STATE IMAGING DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2012-03-01
Information query
IPC分类: