Invention Grant
- Patent Title: Near-infrared light-emitting diode and method for manufacturing the same
- Patent Title (中): 近红外发光二极管及其制造方法
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Application No.: US14520494Application Date: 2014-10-22
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Publication No.: US09362453B2Publication Date: 2016-06-07
- Inventor: Yu-Chiang Chao , Yu-Chi Huang
- Applicant: CHUNG YUAN CHRISTIAN UNIVERSITY
- Applicant Address: TW Chung Li
- Assignee: Chung Yuan Christian University
- Current Assignee: Chung Yuan Christian University
- Current Assignee Address: TW Chung Li
- Agency: Rosenberg, Klein & Lee
- Priority: TW103128520A 20140820
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/26 ; H01L31/032 ; H01L21/02 ; H01L31/028 ; H01L31/04

Abstract:
The present invention relates generally to a near-infrared light-emitting diode (LED) and the method for manufacturing the same. When preparing the light-emitting layer of the near-infrared LED according to the present invention, the CsSnXX′2 solution is coated on the substrate having the hole transport layer. Then, by a drying process, the solvent is moved away and the CsSnXX′2 solution is solidified, crystallized to CsSnXX′2 in the perovskite structure, which is used as the light-emitting layer of the near-infrared LED and emits near infrared. X and X′ are identical or different halogen elements. In addition, according to the present invention, lead can be used to replace a part of tin. By adjusting the ratio of lead and tin or adopting different combination of halogen elements, the wavelength of the generated near infrared varies.
Public/Granted literature
- US20160056337A1 NEAR-INFRARED LIGHT-EMITTING DIODE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-02-25
Information query
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