Invention Grant
- Patent Title: Magnetic memory device having perpendicular magnetic tunnel junction pattern and method of forming the same
- Patent Title (中): 具有垂直磁隧道结图案的磁存储器件及其形成方法
-
Application No.: US14686761Application Date: 2015-04-14
-
Publication No.: US09362486B2Publication Date: 2016-06-07
- Inventor: KeeWon Kim , SangHwan Park , JaeHoon Kim
- Applicant: KeeWon Kim , SangHwan Park , JaeHoon Kim
- Applicant Address: KR
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR
- Agency: Renaissance IP Law Group LLP
- Priority: KR10-2014-0130491 20140929
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L43/02 ; G11C11/16

Abstract:
Provided are a magnetic memory device and a method of forming the same. The magnetic memory device includes a pinned pattern including a coupling enhancement pattern, a polarization enhancement pattern, and a texture blocking pattern located between the coupling enhancement pattern and the polarization enhancement pattern, a free pattern located on the polarization enhancement pattern of the pinned pattern, and a tunnel barrier located between the pinned pattern and the free pattern. The coupling enhancement pattern includes a first enhancement magnetic pattern, a second enhancement magnetic pattern, and a first enhancement non-magnetic pattern located between the first enhancement magnetic pattern and the second enhancement magnetic pattern.
Public/Granted literature
Information query
IPC分类: