Invention Grant
- Patent Title: Method of joining semiconductor substrate
- Patent Title (中): 接合半导体衬底的方法
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Application No.: US14319324Application Date: 2014-06-30
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Publication No.: US09368373B2Publication Date: 2016-06-14
- Inventor: Ilseon Yoo , Hiwon Lee , Soon-myung Kwon , Hyunsoo Kim
- Applicant: Hyundai Motor Company
- Applicant Address: KR Seoul
- Assignee: Hyundai Motor Company
- Current Assignee: Hyundai Motor Company
- Current Assignee Address: KR Seoul
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Priority: KR10-2013-0167809 20131230
- Main IPC: H01L21/50
- IPC: H01L21/50 ; H01L21/308 ; H01L21/306 ; H01L21/18

Abstract:
A method of joining semiconductor substrates includes: forming an alignment key on a first semiconductor substrate; forming a first protrusion and a second protrusion, and an alignment recess positioned between the first protrusion and the second protrusion on a second semiconductor substrate; forming a first metal layer and a second metal layer on the first protrusion and the second protrusion, respectively; and joining the first semiconductor substrate and the second semiconductor substrate, in which the alignment key is positioned at the alignment recess when the first semiconductor substrate and the second semiconductor substrate are joined.
Public/Granted literature
- US20150187604A1 METHOD OF JOINING SEMICONDUCTOR SUBSTRATE Public/Granted day:2015-07-02
Information query
IPC分类: