Invention Grant
- Patent Title: Systems and methods of controlling semiconductor wafer fabrication processes
- Patent Title (中): 控制半导体晶圆制造工艺的系统和方法
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Application No.: US13419952Application Date: 2012-03-14
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Publication No.: US09368379B2Publication Date: 2016-06-14
- Inventor: Shih-Hung Chen , Ying Xiao , Chin-Hsiang Lin
- Applicant: Shih-Hung Chen , Ying Xiao , Chin-Hsiang Lin
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: G06F15/00
- IPC: G06F15/00 ; G01B11/26 ; H01L21/67 ; H01L21/68 ; H01L21/687

Abstract:
A system and method of controlling a semiconductor wafer fabrication process. The method includes positioning a semiconductor wafer on a wafer support assembly in a wafer processing module. A signal is transmitted from a signal emitter positioned at a predetermined transmission angle relative to an axis normal to the wafer support assembly to check leveling of the wafer in the module, so that the signal is reflected from the wafer. The embodiment includes monitoring for the reflected signal at a predetermined reflectance angle relative to the axis normal to the wafer support assembly at a signal receiver. A warning indication is generated if the reflected signal is not received at the signal receiver.
Public/Granted literature
- US20130245978A1 SYSTEMS AND METHODS OF CONTROLLING SEMICONDUCTOR WAFER FABRICATION PROCESSES Public/Granted day:2013-09-19
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