Invention Grant
- Patent Title: Group-III nitride semiconductor light-emitting element and manufacturing method therefor
- Patent Title (中): III族氮化物半导体发光元件及其制造方法
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Application No.: US14181644Application Date: 2014-02-15
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Publication No.: US09368687B2Publication Date: 2016-06-14
- Inventor: Toshiya Uemura
- Applicant: TOYODA GOSEI CO., LTD.
- Applicant Address: JP Kiyosu-shi, Aichi-ken
- Assignee: TOYODA GOSEI CO., LTD.
- Current Assignee: TOYODA GOSEI CO., LTD.
- Current Assignee Address: JP Kiyosu-shi, Aichi-ken
- Agency: McGinn IP Law Group PLLC
- Priority: JP2013-029514 20130218
- Main IPC: H01L33/38
- IPC: H01L33/38 ; H01L33/32 ; H01L33/10 ; H01L33/00

Abstract:
A group-III nitride semiconductor light emitting element includes a semiconductor layer that includes a light emitting layer, a p-type semiconductor layer and an n-type semiconductor layer, a p-contact electrode that is in contact with the p-type semiconductor layer, an n-contact electrode that is in contact with the n-type semiconductor layer, and a support substrate that supports the semiconductor layer. The p-contact electrode and the n-contact electrode are disposed at a position between the semiconductor layer and the support substrate. In a case where the p-contact electrode and the n-contact electrode are orthogonally projected on a plate surface of the support substrate, the p-contact electrode and the n-contact electrode are formed in a shape in which the orthogonally projected p-contact electrode and the orthogonally projected n-contact electrode are not overlapped with each other.
Public/Granted literature
- US20140231853A1 GROUP-III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND MANUFACTURING METHOD THEREFOR Public/Granted day:2014-08-21
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