Invention Grant
- Patent Title: Basic electromagnetic force field
- Patent Title (中): 基本电磁力场
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Application No.: US13526460Application Date: 2012-06-18
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Publication No.: US09374884B2Publication Date: 2016-06-21
- Inventor: Manu Mitra
- Applicant: Manu Mitra
- Agency: Cionca Law Group P.C.
- Agent Marin Cionca
- Main IPC: B05D3/14
- IPC: B05D3/14 ; H05H1/24 ; F03H1/00 ; H05H1/48 ; H05H1/54

Abstract:
An electromagnetic force field configured to protect designated assets against incoming objects, comprising a plurality of layers, wherein the layers are a member of a group consisting of a supercharged plasma window, a curtain of high-energy laser beams arranged in a lattice-like configuration, and a carbon nanotube (CNT) layer, wherein the laser beams are positioned at equal distance between each other and as such as to ensure that at least four laser beams are in the path of the smallest object, and wherein, the CNT layer comprises a plurality of CNT sheets.
Public/Granted literature
- US20150305132A1 BASIC ELECTROMAGNETIC FORCE FIELD Public/Granted day:2015-10-22
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