Invention Grant
- Patent Title: Method and apparatus for cleaning semiconductor substrates
- Patent Title (中): 用于清洁半导体衬底的方法和装置
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Application No.: US13453832Application Date: 2012-04-23
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Publication No.: US09378989B2Publication Date: 2016-06-28
- Inventor: Paul Mertens , Steven Brems , Elisabeth Camerotto , Marc Hauptmann
- Applicant: Paul Mertens , Steven Brems , Elisabeth Camerotto , Marc Hauptmann
- Applicant Address: BE Leuven BE Leuven
- Assignee: IMEC,Katholieke Universiteit Leuven, KU LEUVEN R&D
- Current Assignee: IMEC,Katholieke Universiteit Leuven, KU LEUVEN R&D
- Current Assignee Address: BE Leuven BE Leuven
- Agency: McDonnell Boehnen Hulbert & Berghoff LLP
- Priority: EP11163336 20110421
- Main IPC: B08B3/12
- IPC: B08B3/12 ; B08B13/00 ; H01L21/67 ; H01L21/02
Abstract:
The present invention is related to a method and apparatus for cleaning a substrate, in particular a semiconductor substrate such as a silicon wafer. The substrate is placed in a tank containing a cleaning liquid, at an angle with respect to acoustic waves produced in said liquid. The angle corresponds to the angle of transmission, i.e. the angle at which waves are not reflected off the substrate surface. A damping material is provided in the tank, arranged to absorb substantially all waves thus transmitted through the substrate. A significant improvement in terms of cleaning efficiency is obtained by the method of the invention.
Public/Granted literature
- US20120266912A1 Method and Apparatus for Cleaning Semiconductor Substrates Public/Granted day:2012-10-25
Information query
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