Invention Grant
- Patent Title: Silicon based charge neutralization systems
- Patent Title (中): 硅基电荷中和系统
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Application No.: US14665994Application Date: 2015-03-23
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Publication No.: US09380689B2Publication Date: 2016-06-28
- Inventor: Peter Gefter , Aleksey Klochkov
- Applicant: Illinois Tool Works Inc.
- Applicant Address: US IL Glenview
- Assignee: ILLINOIS TOOL WORKS INC.
- Current Assignee: ILLINOIS TOOL WORKS INC.
- Current Assignee Address: US IL Glenview
- Agency: Uriarte Law
- Main IPC: H01T23/00
- IPC: H01T23/00 ; H05F3/06 ; B08B7/00 ; B32B7/12 ; B32B15/08 ; B32B15/082 ; B32B15/085 ; B32B15/18 ; B32B17/10 ; B32B27/30 ; B32B27/32 ; H01L31/048

Abstract:
An embodiment of the invention provides a method for low emission charge neutralization, comprising: generating a high frequency alternating current (AC) voltage; transmitting the high frequency AC voltage to at least one non-metallic emitter; wherein the at least one non-metallic emitter comprises at least 70% silicon by weight and less than 99.99% silicon by weight; wherein the at least one emitter comprises at least one treated surface section with a destroyed oxidation layer; and generating ions from the at least one non-metallic emitter in response to the high frequency AC voltage. Another embodiment of the invention provides an apparatus for low emission charge neutralization wherein the apparatus can perform the above-described operations.
Public/Granted literature
- US20150282286A1 Silicon Based Charge Neutralization Systems Public/Granted day:2015-10-01
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