Invention Grant
- Patent Title: Methods and materials for anchoring gapfill metals
- Patent Title (中): 锚定缝隙金属的方法和材料
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Application No.: US14515816Application Date: 2014-10-16
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Publication No.: US09382627B2Publication Date: 2016-07-05
- Inventor: Artur Kolics
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Beyer Law Group LLP
- Main IPC: C23C18/18
- IPC: C23C18/18 ; B32B15/04 ; B32B3/30 ; H01L21/768 ; C23C18/52

Abstract:
One aspect of the present invention includes a method of fabricating an electronic device. According to one embodiment, the method comprises providing a substrate having dielectric oxide surface areas adjacent to electrically conductive surface areas, chemically bonding an anchor compound with the dielectric oxide surface areas so as to form an anchor layer, initiating the growth of a metal using the electrically conductive surface areas and growing the metal so that the anchor layer also bonds with the metal. The anchor compound has at least one functional group capable of forming a chemical bond with the oxide surface and has at least one functional group capable of forming a chemical bond with the metal. Another aspect of the present invention is an electronic device. A third aspect of the present invention is a solution comprising the anchor compound.
Public/Granted literature
- US20150033980A1 METHODS AND MATERIALS FOR ANCHORING GAPFILL METALS Public/Granted day:2015-02-05
Information query
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