Invention Grant
- Patent Title: Methods and heat treatment apparatus for uniformly heating a substrate during a bake process
- Patent Title (中): 烘烤过程中均匀加热基材的方法和热处理装置
-
Application No.: US11693818Application Date: 2007-03-30
-
Publication No.: US09383138B2Publication Date: 2016-07-05
- Inventor: Steven Scheer , Michael A. Carcasi
- Applicant: Steven Scheer , Michael A. Carcasi
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evans, LLP
- Main IPC: F27D11/00
- IPC: F27D11/00 ; F27B17/00

Abstract:
Methods and heat treatment apparatus for heating a substrate and any layer carried on the substrate during a bake process. A heat exchange gap between the substrate and a heated support is at least partially filled by a gas having a high thermal conductivity. The high thermal conductivity gas is introduced into the heat exchange gap by displacing a lower thermal conductivity originally present in the heat exchange gap when the substrate is loaded. Heat transfer across the heat exchange gap is mediated by the high thermal conductivity gas.
Public/Granted literature
- US20080237214A1 METHODS AND HEAT TREATMENT APPARATUS FOR UNIFORMLY HEATING A SUBSTRATE DURING A BAKE PROCESS Public/Granted day:2008-10-02
Information query