Invention Grant
- Patent Title: Test structure to monitor the in-situ channel temperature of field effect transistors
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Application No.: US14054693Application Date: 2013-10-15
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Publication No.: US09383266B1Publication Date: 2016-07-05
- Inventor: James Chingwei Li , Tahir Hussain
- Applicant: HRL Laboratories, LLC
- Applicant Address: US CA Malibu
- Assignee: HRL Laboratories, LLC
- Current Assignee: HRL Laboratories, LLC
- Current Assignee Address: US CA Malibu
- Agency: Ladas & Parry
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L29/423 ; H01L21/66 ; H01L21/768 ; G01K7/22

Abstract:
A field effect transistor (FET) having a source, a drain and a gate includes a first connection electrically connected to the gate near a first end of the gate, a second connection electrically connected to the gate near the first end of the gate, a third connection electrically connected to the gate near a second end of the gate, and a fourth connection electrically connected to the gate near the second end of the gate. By performing gate resistance measurements at different ambient temperatures, a thermal coefficient of gate resistance can be derived and then used to monitor the gate temperature, which is representative of the channel temperature.
Information query
IPC分类: