Invention Grant
- Patent Title: Waveguide structure
- Patent Title (中): 波导结构
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Application No.: US13938730Application Date: 2013-07-10
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Publication No.: US09383513B2Publication Date: 2016-07-05
- Inventor: Wan-Yu Lee , Ying-Hao Kuo , Tien-I Bao
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: G02B6/02
- IPC: G02B6/02 ; G02B6/125 ; G02B6/136 ; G02B6/12 ; G02B6/122

Abstract:
A waveguide structure includes a bottom dielectric layer, a core layer disposed over the bottom dielectric layer, an etch stop layer disposed over the core layer, and a cladding layer or a buffer layer disposed over the etch stop layer. The waveguide structure is configured to guide a light signal through different geography, such as straight, taper, turning, grating and tight coupling sections.
Public/Granted literature
- US20150016793A1 Waveguide Structure Public/Granted day:2015-01-15
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