Invention Grant
- Patent Title: Exposure apparatus and exposure method
- Patent Title (中): 曝光装置和曝光方法
-
Application No.: US13381350Application Date: 2011-12-16
-
Publication No.: US09383650B2Publication Date: 2016-07-05
- Inventor: Jehao Hsu , Minghung Shih , Jingfeng Xue
- Applicant: Jehao Hsu , Minghung Shih , Jingfeng Xue
- Applicant Address: CN Guangdong
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Guangdong
- Priority: CN201110418418 20111215
- International Application: PCT/CN2011/084102 WO 20111216
- International Announcement: WO2013/086730 WO 20130620
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer.
Public/Granted literature
- US20130155383A1 EXPOSURE APPARATUS AND EXPOSURE METHOD Public/Granted day:2013-06-20
Information query
IPC分类:
