Invention Grant
- Patent Title: Light-exposure device
- Patent Title (中): 曝光装置
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Application No.: US14001863Application Date: 2012-02-02
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Publication No.: US09383652B2Publication Date: 2016-07-05
- Inventor: Koichi Kajiyama , Michinobu Mizumura , Makoto Hatanaka
- Applicant: Koichi Kajiyama , Michinobu Mizumura , Makoto Hatanaka
- Applicant Address: JP Yokohama-shi, Kanagawa
- Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Yokohama-shi, Kanagawa
- Agency: McGinn IP Law Group PLLC
- Priority: JP2011-045576 20110302
- International Application: PCT/JP2012/052376 WO 20120202
- International Announcement: WO2012/117801 WO 20120907
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20 ; G02B3/00

Abstract:
A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time.
Public/Granted literature
- US20130342820A1 LIGHT-EXPOSURE DEVICE Public/Granted day:2013-12-26
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