Invention Grant
US09383653B2 Ultraviolet laser device, and exposure device and inspection device provided with ultraviolet laser device
有权
紫外线激光装置,以及配有紫外线激光装置的曝光装置和检查装置
- Patent Title: Ultraviolet laser device, and exposure device and inspection device provided with ultraviolet laser device
- Patent Title (中): 紫外线激光装置,以及配有紫外线激光装置的曝光装置和检查装置
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Application No.: US14382093Application Date: 2013-03-05
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Publication No.: US09383653B2Publication Date: 2016-07-05
- Inventor: Akira Tokuhisa
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-048210 20120305
- International Application: PCT/JP2013/056011 WO 20130305
- International Announcement: WO2013/133279 WO 20130912
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; H01S3/23 ; H01S3/00 ; G02F1/35 ; H01S3/067 ; H01S3/16

Abstract:
An ultraviolet laser device, includes: a first laser light output unit outputs a first infrared laser light; a second laser light output unit outputs a second infrared laser light; a first wavelength conversion optical system generates a first ultraviolet laser light of a fifth harmonic of the first infrared laser light; and a second wavelength conversion optical system to which the first ultraviolet laser light and the second infrared laser light enter, wherein the second wavelength conversion optical system includes a first wavelength conversion optical element which generates a second ultraviolet laser light by sum frequency generation of the first ultraviolet laser light and the second infrared laser light, and a second wavelength conversion optical element which generates a deep ultraviolet laser light by sum frequency generation of the second ultraviolet laser light and the second infrared laser light.
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