Invention Grant
US09383653B2 Ultraviolet laser device, and exposure device and inspection device provided with ultraviolet laser device 有权
紫外线激光装置,以及配有紫外线激光装置的曝光装置和检查装置

  • Patent Title: Ultraviolet laser device, and exposure device and inspection device provided with ultraviolet laser device
  • Patent Title (中): 紫外线激光装置,以及配有紫外线激光装置的曝光装置和检查装置
  • Application No.: US14382093
    Application Date: 2013-03-05
  • Publication No.: US09383653B2
    Publication Date: 2016-07-05
  • Inventor: Akira Tokuhisa
  • Applicant: NIKON CORPORATION
  • Applicant Address: JP Tokyo
  • Assignee: NIKON CORPORATION
  • Current Assignee: NIKON CORPORATION
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff PLC
  • Priority: JP2012-048210 20120305
  • International Application: PCT/JP2013/056011 WO 20130305
  • International Announcement: WO2013/133279 WO 20130912
  • Main IPC: G03B27/54
  • IPC: G03B27/54 G03F7/20 H01S3/23 H01S3/00 G02F1/35 H01S3/067 H01S3/16
Ultraviolet laser device, and exposure device and inspection device provided with ultraviolet laser device
Abstract:
An ultraviolet laser device, includes: a first laser light output unit outputs a first infrared laser light; a second laser light output unit outputs a second infrared laser light; a first wavelength conversion optical system generates a first ultraviolet laser light of a fifth harmonic of the first infrared laser light; and a second wavelength conversion optical system to which the first ultraviolet laser light and the second infrared laser light enter, wherein the second wavelength conversion optical system includes a first wavelength conversion optical element which generates a second ultraviolet laser light by sum frequency generation of the first ultraviolet laser light and the second infrared laser light, and a second wavelength conversion optical element which generates a deep ultraviolet laser light by sum frequency generation of the second ultraviolet laser light and the second infrared laser light.
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