Invention Grant
- Patent Title: Reduction of warpage of multilayered substrate or package
- Patent Title (中): 降低多层基材或包装的翘曲
-
Application No.: US14193004Application Date: 2014-02-28
-
Publication No.: US09384314B2Publication Date: 2016-07-05
- Inventor: Sayuri Hada , Keiji Matsumoto
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent David Quinn, Esq.
- Main IPC: H01L21/20
- IPC: H01L21/20 ; G06F17/50

Abstract:
A method that minimizes adjustment of a wiring layer in reducing a warpage of a multilayered substrate and enables location of a part of a wiring layer that needs correction in order to reduce the warpage. The difference in average coefficient of thermal expansion, Δα, varies in a substrate. The method focuses in on the difference in Δα with a great length scale (low frequency) having a relatively significant effect on the warpage compared to the difference in Δα with a smaller length scale (high frequency) and corrects only the difference in Δα with a greater length scale. The distribution of the difference in Δα in a plane of substrate is determined. Then digital filtering is performed to extract only the difference in Δα with a low frequency and the difference in Δα between before and after correction, thereby revealing a part that requires correction.
Public/Granted literature
- US20150248516A1 REDUCTION OF WARPAGE OF MULTILAYERED SUBSTRATE OR PACKAGE Public/Granted day:2015-09-03
Information query
IPC分类: