Invention Grant
- Patent Title: Systems and methods for interferometric phase measurement
- Patent Title (中): 用于干涉测量的系统和方法
-
Application No.: US14095624Application Date: 2013-12-03
-
Publication No.: US09384540B2Publication Date: 2016-07-05
- Inventor: Benno Orschel
- Applicant: SunEdison Semiconductor Limited (UEN201334164H)
- Applicant Address: SG Singapore
- Assignee: SunEdison Semiconductor Limited (UEN201334164H)
- Current Assignee: SunEdison Semiconductor Limited (UEN201334164H)
- Current Assignee Address: SG Singapore
- Agency: Armstrong Teasdale LLP
- Main IPC: H04N7/18
- IPC: H04N7/18 ; G06K9/00 ; G06T7/00 ; G01B9/02 ; G01N21/88
Abstract:
A method for measuring phase shift to detect irregularities of a surface is described. Additionally, a system for measuring phase shift to detect irregularities of a surface is provided. Further, a non-transitory computer-readable storage medium having computer-executable instructions embodied thereon is described. The computer-executable instructions are for measuring phase shift to detect irregularities of a surface.
Public/Granted literature
- US20150153166A1 SYSTEMS AND METHODS FOR INTERFEROMETRIC PHASE MEASUREMENT Public/Granted day:2015-06-04
Information query
