Invention Grant
- Patent Title: Transfer chamber and method for preventing adhesion of particle
- Patent Title (中): 转移室和防止颗粒附着的方法
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Application No.: US12700771Application Date: 2010-02-05
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Publication No.: US09385015B2Publication Date: 2016-07-05
- Inventor: Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
- Applicant: Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2009-027369 20090209
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/67

Abstract:
A transfer chamber is provided between a processing unit for performing a predetermined process on a target substrate to be processed in a depressurized environment and an atmospheric maintaining unit for maintaining the target substrate in an atmospheric environment to transfer the target substrate therebetween. The transfer chamber includes a chamber main body for accommodating the target substrate, a gas exhaust unit for exhausting the chamber main body to set the chamber main body to the depressurized environment, and a gas supply unit for supplying a predetermined gas to the chamber main body to set the chamber main body in the atmospheric environment. Further, in the transfer chamber, an ionization unit is provided outside the chamber main body, for ionizing the predetermined gas and an ionized gas supply unit is provided to supply the ionized gas generated by the ionization unit to the chamber main body.
Public/Granted literature
- US20100202093A1 TRANSFER CHAMBER AND METHOD FOR PREVENTING ADHESION OF PARTICLE Public/Granted day:2010-08-12
Information query
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