Invention Grant
- Patent Title: Semiconductor integrated circuit device
- Patent Title (中): 半导体集成电路器件
-
Application No.: US14499707Application Date: 2014-09-29
-
Publication No.: US09385125B2Publication Date: 2016-07-05
- Inventor: Tomohiro Imai , Masaharu Yamaji
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kawasaki-shi
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2012-202126 20120913
- Main IPC: H01L27/092
- IPC: H01L27/092 ; H01L21/8238 ; H01L21/761 ; H01L27/12 ; H01L29/06 ; H01L29/10

Abstract:
An MV-PMOS and MV-NMOS configuring a high side drive circuit are formed in an n-type isolation region formed on a p-type semiconductor substrate. The MV-NMOS is connected to a p-type isolation region of an intermediate potential in the interior of the n-type isolation region. An n-type epitaxial region is provided in a surface layer of the p-type semiconductor substrate on the outer side of the n-type isolation region, and a p-type GND region of a ground potential (GND) is provided on the outer side of the n-type epitaxial region. A cavity is provided between the p-type semiconductor substrate and n-type epitaxial region between the high side drive circuit and p-type GND region, and a p-type diffusion region is provided penetrating the n-type epitaxial region and reaching the cavity. The intermediate potential is applied to the p-type isolation region.
Public/Granted literature
- US20150014783A1 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE Public/Granted day:2015-01-15
Information query
IPC分类: