Invention Grant
US09385188B2 Semiconductor device with termination region having floating electrodes in an insulating layer
有权
具有终端区域的半导体器件,在绝缘层中具有浮置电极
- Patent Title: Semiconductor device with termination region having floating electrodes in an insulating layer
- Patent Title (中): 具有终端区域的半导体器件,在绝缘层中具有浮置电极
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Application No.: US14372103Application Date: 2012-11-27
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Publication No.: US09385188B2Publication Date: 2016-07-05
- Inventor: Yasuhiro Hirabayashi , Akinori Sakakibara
- Applicant: Yasuhiro Hirabayashi , Akinori Sakakibara
- Applicant Address: JP Toyota
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee Address: JP Toyota
- Agency: Oliff PLC
- Priority: JP2012-003877 20120112
- International Application: PCT/JP2012/080624 WO 20121127
- International Announcement: WO2013/105350 WO 20130718
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/40 ; H01L29/66 ; H01L29/739 ; H01L29/78

Abstract:
A semiconductor device which can suppress the influence of the external electric charge and can be efficiently manufactured is provided. The semiconductor device is provided with an active region in which a semiconductor element is disposed and a termination region between the active region and an edge surface of the semiconductor substrate. An insulating layer is disposed on at least a part of an upper surface of the termination region. A plurality of floating electrodes is disposed at an interval in the insulating layer in a direction from the active region toward the edge surface of the semiconductor substrate, and a width of the plurality of floating electrodes in a thickness direction of the semiconductor substrate is greater than a width of the plurality of floating electrodes in the direction from the active region toward the edge surface of the semiconductor substrate.
Public/Granted literature
- US20140374871A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-12-25
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