Invention Grant
- Patent Title: Method of manufacturing semiconductor chips
- Patent Title (中): 制造半导体芯片的方法
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Application No.: US14877592Application Date: 2015-10-07
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Publication No.: US09385268B2Publication Date: 2016-07-05
- Inventor: Takeshi Minamiru , Michiaki Murata , Kenji Yamazaki , Tsutomu Otsuka
- Applicant: FUJI XEROX CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: FUJI XEROX CO., LTD.
- Current Assignee: FUJI XEROX CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2014-227664 20141110; JP2014-227665 20141110; JP2014-237293 20141125
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L33/00

Abstract:
A method of manufacturing semiconductor chips includes: forming grooves on a front face side of a substrate; and forming grooves on a back face side of the substrate as defined herein, and in manufacturing conditions in which a variation range of a top section of the cutting member having a tapered tip end shape with no top face in the groove width direction changes from a range included in the groove on the front face side to a range away from the groove on the front face side as wear of the cutting member advances, the use of the cutting member is stopped before the variation range changes from the range included in the groove on the front face side to the range away from the groove on the front face side.
Public/Granted literature
- US20160133784A1 METHOD OF MANUFACTURING SEMICONDUCTOR CHIPS Public/Granted day:2016-05-12
Information query
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