Invention Grant
- Patent Title: Patterned opto-electrical substrate and method for manufacturing the same
- Patent Title (中): 图案化的光电基板及其制造方法
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Application No.: US14104547Application Date: 2013-12-12
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Publication No.: US09385274B2Publication Date: 2016-07-05
- Inventor: Wen-Cheng Ke , Wei-Kuo Chen , Fwu-Yih Houng , Chia-Che Ho
- Applicant: Kinik Company
- Applicant Address: TW Taipei
- Assignee: KINIK COMPANY
- Current Assignee: KINIK COMPANY
- Current Assignee Address: TW Taipei
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW102133449A 20130916
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/0256 ; H01L33/22 ; H01L33/12 ; H01L33/32 ; H01L33/00 ; H01L21/02
Abstract:
The present invention relates to a patterned opto-electrical substrate, comprising a substrate, the substrate has a first patterned structure, a spacer region and a second patterned structure, wherein the second patterned structure is formed on one or both of the first patterned structure and the spacer region, and the first patterned structure is a micron-scale protruding structure or a micron-scale recessing structure, while the second patterned structure is a submicron-scale recessing structure. The present invention also relates to a method for manufacturing the aforementioned patterned opto-electrical substrate and light emitting diodes having the aforementioned patterned opto-electrical substrate.
Public/Granted literature
- US20150076505A1 PATTERNED OPTO-ELECTRICAL SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2015-03-19
Information query
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