Invention Grant
- Patent Title: Magnetic memory and method of manufacturing the same
- Patent Title (中): 磁存储器及其制造方法
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Application No.: US14203249Application Date: 2014-03-10
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Publication No.: US09385304B2Publication Date: 2016-07-05
- Inventor: Masahiko Nakayama , Tadashi Kai , Masaru Toko , Hiroaki Yoda , Hyung Suk Lee , Jae Geun Oh , Choon Kun Ryu , Min Suk Lee
- Applicant: Masahiko Nakayama , Tadashi Kai , Masaru Toko , Hiroaki Yoda , Hyung Suk Lee , Jae Geun Oh , Choon Kun Ryu , Min Suk Lee
- Applicant Address: JP Tokyo KR Icheon-si, Gyeonggi-do
- Assignee: KABUSHIKI KAISHA TOSHIBA,SK HYNIX INC.
- Current Assignee: KABUSHIKI KAISHA TOSHIBA,SK HYNIX INC.
- Current Assignee Address: JP Tokyo KR Icheon-si, Gyeonggi-do
- Agency: Holtz, Holtz & Volek PC
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L43/02 ; H01L43/12 ; H01L45/00 ; G11C11/56 ; G11C11/15 ; G11C11/16 ; H01L27/22 ; H01L27/24 ; H01L43/08 ; H01L43/10

Abstract:
According to one embodiment, a magnetic memory is disclosed. The memory includes a conductive layer containing a first metal material, a stacked body above the conductive layer, and including a first magnetization film containing a second metal material, a second magnetization film, and a tunnel barrier layer between the first magnetization film and the second magnetization film, and an insulating layer on a side face of the stacked body, and containing an oxide of the first metal material. The first magnetization film and/or the second magnetization film includes a first region positioned in a central portion, and a second region positioned in an edge portion and containing As, P, Ge, Ga, Sb, In, N, Ar, He, F, Cl, Br, I, Si, B, C, O, Zr, Tb, S, Se, or Ti.
Public/Granted literature
- US20150069558A1 MAGNETIC MEMORY AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2015-03-12
Information query
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