Invention Grant
- Patent Title: First and second differential interconnects having interleaved stub traces
- Patent Title (中): 第一和第二差分互连具有交错短截线
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Application No.: US14228002Application Date: 2014-03-27
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Publication No.: US09386690B2Publication Date: 2016-07-05
- Inventor: Ruihua Ding , Min Wang , Mo Liu
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwegman Lundberg & Woessner, P.A.
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H01P3/04 ; H04B3/32 ; H05K3/10 ; H01P3/02 ; H01P1/203

Abstract:
This disclosure relates generally to an electronic assembly and method having a first electrical connection point and a second electrical connection point and a differential interconnect coupling the first electrical connection point to the second electrical connection point, the differential interconnect including first and second transmission traces including a interior edges and a exterior edges opposite the interior edges, the second interior edge facing the first interior edge, and stub traces, each stub trace coupled to one of the first and second transmission traces and projecting from one of the first interior edge, the first exterior edge, the second interior edge, and the second exterior edge. A substantially equal number of stub traces project from the first exterior edge and the second exterior edge. At least twice as many stub traces project from the first and second exterior edges as project from the first and second interior edges.
Public/Granted literature
- US20150280778A1 DIFFERENTIAL INTERCONNECT WITH STUB TRACES Public/Granted day:2015-10-01
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