Invention Grant
- Patent Title: Fluid handling device
- Patent Title (中): 流体处理装置
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Application No.: US14731491Application Date: 2015-06-05
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Publication No.: US09387477B2Publication Date: 2016-07-12
- Inventor: Koichi Ono , Ken Kitamoto
- Applicant: Enplas Corporation
- Applicant Address: JP Saitama
- Assignee: Enplas Corporation
- Current Assignee: Enplas Corporation
- Current Assignee Address: JP Saitama
- Agency: Brundidge & Stanger, P.C.
- Priority: JP2014-123551 20140616
- Main IPC: B01L3/00
- IPC: B01L3/00 ; G01N15/06 ; G01N33/00 ; G01N33/48

Abstract:
A fluid handling device includes a substrate, a film and a conductive layer. The substrate includes a through hole or a recess. The film includes first, second and third regions. The conductive layer is disposed on one surface of the film across the first, second and third regions. The first region of the film is bonded to one surface of the substrate such that one of openings of the through hole or an opening of the recess is closed to form a housing part, and that a part of the conductive layer is exposed to the inside of the housing part. The second region of the film is bent such that the conductive layer is located on an outside. The third region of the film is bonded to the first region of the film such that the conductive layer is exposed to the exterior.
Public/Granted literature
- US20150360223A1 FLUID HANDLING DEVICE Public/Granted day:2015-12-17
Information query
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