Invention Grant
US09387659B2 Ablation-type lithographic printing members having improved exposure sensitivity and related methods
有权
具有改进的曝光灵敏度和相关方法的消融型平版印刷部件
- Patent Title: Ablation-type lithographic printing members having improved exposure sensitivity and related methods
- Patent Title (中): 具有改进的曝光灵敏度和相关方法的消融型平版印刷部件
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Application No.: US13295300Application Date: 2011-11-14
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Publication No.: US09387659B2Publication Date: 2016-07-12
- Inventor: Sonia Rondon , Kevin Ray
- Applicant: Sonia Rondon , Kevin Ray
- Applicant Address: US NH Hudson
- Assignee: Presstek, LLC
- Current Assignee: Presstek, LLC
- Current Assignee Address: US NH Hudson
- Agency: Morgan, Lewis & Bockius LLP
- Main IPC: B41N1/08
- IPC: B41N1/08 ; B41C1/10 ; B41N1/00
Abstract:
Ablation-type printing plates having improved exposure sensitivity are produced using a thin imaging layer—i.e., the plate layer that absorbs and ablates in response to imaging radiation—whose composition includes a large proportion of radiation absorber.
Public/Granted literature
- US20120291644A1 ABLATION-TYPE LITHOGRAPHIC PRINTING MEMBERS HAVING IMPROVED EXPOSURE SENSITIVITY AND RELATED METHODS Public/Granted day:2012-11-22
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