Invention Grant
- Patent Title: Photosensitive polymer and photoalignable phase difference film
- Patent Title (中): 光敏聚合物和可光电相位差膜
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Application No.: US14166092Application Date: 2014-01-28
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Publication No.: US09388259B2Publication Date: 2016-07-12
- Inventor: Daisuke Ootsuki
- Applicant: JNC CORPORATION , JNC PETROCHEMICAL CORPORATION
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: JNC CORPORATION,JNC PETROCHEMICAL CORPORATION
- Current Assignee: JNC CORPORATION,JNC PETROCHEMICAL CORPORATION
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Stein IP, LLC
- Priority: JP2013-023588 20130208
- Main IPC: F21V9/00
- IPC: F21V9/00 ; G02B5/02 ; G02C7/10 ; G02F1/361 ; G03B11/00 ; C08F20/68 ; C08F220/30 ; G02F1/13 ; G02B1/10 ; G02B5/30

Abstract:
To provide a photosensitive polymer, a phase difference film using the photosensitive polymer, and an optical film using the phase difference film. A solution is a photosensitive polymer having a constitutional unit represented by formula (1): wherein, in formula (1), for example, R1 is hydrogen or methyl; a is 2 or 3; p is an integer from 1 to 12; X1 is —O—, —COO— or —OCO—; b is an integer from 0 to 3; A1 is a divalent group selected from 1,4-phenylene or naphthalene-2,6-diyl, and in the divalent group, at least one of hydrogen may be replaced by fluorine or chlorine; Z1 is a single bond, —COO—, —CH═CH—COO—, —CH2CH2—COO—, —CH2O— or —CONH—; W1 and W2 are hydrogen, fluorine or 1-5C alkyl or alkoxy; Y1 is —O—; and R2 is 1-20C alkyl, and at least one of —CH2— in the alkyl may be replaced by —O—.
Public/Granted literature
- US20140225047A1 PHOTOSENSITIVE POLYMER AND PHOTOALIGNABLE PHASE DIFFERENCE FILM Public/Granted day:2014-08-14
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