Invention Grant
US09390827B2 EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
有权
具有子系统的EUV光源,用于在EUV非输出期间维持LPP驱动激光输出
- Patent Title: EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
- Patent Title (中): 具有子系统的EUV光源,用于在EUV非输出期间维持LPP驱动激光输出
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Application No.: US14171526Application Date: 2014-02-03
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Publication No.: US09390827B2Publication Date: 2016-07-12
- Inventor: William N. Partlo , Richard L. Sandstrom , Daniel J. W. Brown , Igor V. Fomenkov
- Applicant: CYMER, LLC
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G21K5/00
- IPC: G21K5/00 ; H05G2/00 ; G03F7/20 ; H01S3/117 ; H01S3/223 ; H01S3/23

Abstract:
A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
Public/Granted literature
- US20140145096A1 EUV Light Source With Subsystem(s) For Maintaining LPP Drive Laser Output During EUV Non-Output Periods Public/Granted day:2014-05-29
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