Invention Grant
US09390919B2 Method of forming semiconductor film and photovoltaic device including the film
有权
形成半导体膜的方法和包括该膜的光伏器件
- Patent Title: Method of forming semiconductor film and photovoltaic device including the film
- Patent Title (中): 形成半导体膜的方法和包括该膜的光伏器件
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Application No.: US13552080Application Date: 2012-07-18
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Publication No.: US09390919B2Publication Date: 2016-07-12
- Inventor: David B. Mitzi , Teodor K. Todorov
- Applicant: David B. Mitzi , Teodor K. Todorov
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
A method of depositing a kesterite film which includes a compound of the formula: Cu2-xZn1+ySn(S1-zSez)4+q, wherein 0≦x≦1; 0≦y≦1; 0≦z≦1; −1≦q≦1. The method includes contacting hydrazine, a source of Cu, and a source of at least one of S and Se forming solution A; contacting hydrazine, a source of Sn, a source of at least one of S and Se, and a source of Zn forming dispersion B; mixing solution A and dispersion B under conditions sufficient to form a dispersion which includes Zn-containing solid particles; applying the dispersion onto a substrate to form a thin layer of the dispersion on the substrate; and annealing at a temperature, pressure, and length of time sufficient to form the kesterite film. An annealing composition and a photovoltaic device including the kesterite film formed by the above method are also provided.
Public/Granted literature
- US20120279565A1 METHOD OF FORMING SEMICONDUCTOR FILM AND PHOTOVOLTAIC DEVICE INCLUDING THE FILM Public/Granted day:2012-11-08
Information query
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