Invention Grant
US09391040B2 Planarity-tolerant reworkable interconnect with integrated testing 有权
平面容错的可重复工作互连,集成测试

Planarity-tolerant reworkable interconnect with integrated testing
Abstract:
A structure includes an electrical interconnection between a first substrate including a plurality of protrusions and a second substrate including a plurality of solder bumps, the plurality of protrusions includes sharp tips that penetrate the plurality of solder bumps, and a permanent electrical interconnection is established by physical contact between the plurality of protrusions and the plurality of solder bumps including a metallurgical joint.
Public/Granted literature
Information query
Patent Agency Ranking
0/0