Invention Grant
- Patent Title: Lithography illumination system
- Patent Title (中): 光刻照明系统
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Application No.: US14745361Application Date: 2015-06-19
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Publication No.: US09400433B2Publication Date: 2016-07-26
- Inventor: Aijun Zeng , Linglin Zhu , Ruifang Fang , Huijie Huang
- Applicant: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Applicant Address: CN Shanghai
- Assignee: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Current Assignee: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Current Assignee Address: CN Shanghai
- Agency: Mei & Mark LLP
- Agent Manni Li
- Priority: CN201310030574 20130125
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54 ; G03F7/20 ; G02B3/00 ; G02B19/00 ; G02B26/10
Abstract:
A lithography illumination system, along the transmission direction of the laser light, successively having a laser light source, a collimating and expanding unit, a pupil shaping unit, a first micro-lens array, a micro-integrator rod array, a micro-scanning slit array, a second micro-lens array, a condenser lens group, a mask, and and a motion control unit for controlling the motion of the micro scanning slit array.
Public/Granted literature
- US20150286144A1 LITHOGRAPHY ILLUMINATION SYSTEM Public/Granted day:2015-10-08
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