Invention Grant
US09400436B2 Detection device, exposure apparatus, and device manufacturing method using same
有权
检测装置,曝光装置和使用其的装置制造方法
- Patent Title: Detection device, exposure apparatus, and device manufacturing method using same
- Patent Title (中): 检测装置,曝光装置和使用其的装置制造方法
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Application No.: US14055323Application Date: 2013-10-16
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Publication No.: US09400436B2Publication Date: 2016-07-26
- Inventor: Hironori Maeda
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2012-231653 20121019
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20 ; G03F9/00 ; G01B11/06

Abstract:
A detection device that detects a mark provided on the back side of an object, the detection device includes a first detection unit configured to detect the mark from a surface side of the object; a second detection unit configured to detect a surface position of the object; and a processing unit. The processing unit determines a thickness of the object based on a difference between a first focus position acquired with reference to the position of the mark detected by the first detection unit and a second focus position acquired with reference to the surface position detected by the second detection unit.
Public/Granted literature
- US20140111788A1 DETECTION DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD USING SAME Public/Granted day:2014-04-24
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