Invention Grant
- Patent Title: Position measurement apparatus and exposure apparatus which measure position of object using reference mark, and method of manufacturing device
- Patent Title (中): 使用参考标记测量物体位置的位置测量装置和曝光装置,以及制造装置的方法
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Application No.: US13671930Application Date: 2012-11-08
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Publication No.: US09400437B2Publication Date: 2016-07-26
- Inventor: Noritoshi Sakamoto
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2011-249560 20111115
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01B11/14 ; G03B27/32 ; G03B27/54 ; G03B27/72 ; G03B27/74 ; G03F9/00

Abstract:
A position measurement apparatus that measures a position of an object using a reference mark includes a first illumination optical system configured to illuminate the object using measurement light from a light source which emits light of a first wavelength band, a second illumination optical system configured to illuminate the reference mark using reference light of a second wavelength band, and a position measurement unit configured to detect light from the object and light from the reference mark and to obtain the position of the object based on the detection result, and the second wavelength band of the reference light is set between an upper limit and a lower limit of the first wavelength band of the measurement light from the light source.
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