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US09400865B2 Extracting comprehensive design guidance for in-line process control tools and methods 有权
为在线过程控制工具和方法提取综合设计指导

  • Patent Title: Extracting comprehensive design guidance for in-line process control tools and methods
  • Patent Title (中): 为在线过程控制工具和方法提取综合设计指导
  • Application No.: US14735596
    Application Date: 2015-06-10
  • Publication No.: US09400865B2
    Publication Date: 2016-07-26
  • Inventor: Sagar A. Kekare , Sergei G. Bakarian
  • Applicant: KLA-Tencor Corporation
  • Applicant Address: US CA Milpitas
  • Assignee: KLA-Tencor Corp.
  • Current Assignee: KLA-Tencor Corp.
  • Current Assignee Address: US CA Milpitas
  • Agent Ann Marie Mewherter
  • Main IPC: G06F17/50
  • IPC: G06F17/50
Extracting comprehensive design guidance for in-line process control tools and methods
Abstract:
Methods and systems for extracting comprehensive design guidance for in-line process control of wafers are provided. One method includes automatically identifying potential marginalities in a design for a device to be formed on a wafer. The method also includes automatically generating information for the potential marginalities. The automatically generated information is used to set up process control for the wafer.
Abstract(Chinese):

提供了提供晶圆在线过程控制综合设计指导的方法和系统。 一种方法包括自动识别要在晶片上形成的器件的设计中的潜在边缘。 该方法还包括为潜在的边际自动生成信息。 自动生成的信息用于设置晶圆的过程控制。

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