Invention Grant
- Patent Title: Polishing composition for edge roll-off improvement
- Patent Title (中): 抛光组合物用于边缘滚降改进
-
Application No.: US14269622Application Date: 2014-05-05
-
Publication No.: US09401104B2Publication Date: 2016-07-26
- Inventor: Hon Wu Lau , Michael White
- Applicant: Cabot Microelectronics Corporation
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas Omholt; Arlene Hornilla; Ashlee B. Szelag
- Main IPC: G09G1/02
- IPC: G09G1/02 ; B24B37/04 ; H01L21/321 ; C09G1/04
Abstract:
The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising wet-process silica particles, (b) a water-soluble polymer, (c) an oxidizing agent, (d) a chelating agent, (e) a pH-adjusting agent, and (f) an aqueous carrier, wherein the pH of the polishing composition is about 1 to about 7. The invention also provides a method of polishing a substrate, especially a nickel-phosphorus substrate, with the polishing composition.
Public/Granted literature
- US20150315417A1 POLISHING COMPOSITION FOR EDGE ROLL-OFF IMPROVEMENT Public/Granted day:2015-11-05
Information query
