Invention Grant
US09401271B2 Susceptor assemblies for supporting wafers in a reactor apparatus
有权
用于在反应器装置中支撑晶片的受体组件
- Patent Title: Susceptor assemblies for supporting wafers in a reactor apparatus
- Patent Title (中): 用于在反应器装置中支撑晶片的受体组件
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Application No.: US13838284Application Date: 2013-03-15
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Publication No.: US09401271B2Publication Date: 2016-07-26
- Inventor: John Allen Pitney , Manabu Hamano
- Applicant: SunEdison Semiconductor Limited (UEN201334164H)
- Applicant Address: SG Singapore
- Assignee: SunEdison Semiconductor Limited (UEN201334164H)
- Current Assignee: SunEdison Semiconductor Limited (UEN201334164H)
- Current Assignee Address: SG Singapore
- Agency: Armstrong Teasdale LLP
- Main IPC: C30B25/12
- IPC: C30B25/12 ; H01L21/02 ; C30B25/10 ; C30B25/16 ; C23C16/458 ; H01L21/687
Abstract:
Apparatus and methods for wafer processes such as etching and chemical vapor deposition processes are disclosed. In some embodiments, the apparatus includes a susceptor and a ring disposed beneath the susceptor to influence a thickness of the deposited epitaxial layer.
Public/Granted literature
- US20130276695A1 SUSCEPTOR ASSEMBLIES FOR SUPPORTING WAFERS IN A REACTOR APPARATUS Public/Granted day:2013-10-24
Information query
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