Invention Grant
- Patent Title: Methods of forming memory structures
- Patent Title (中): 形成记忆结构的方法
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Application No.: US14853775Application Date: 2015-09-14
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Publication No.: US09401476B2Publication Date: 2016-07-26
- Inventor: Durai Vishak Nirmal Ramaswamy , Mark S. Korber
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L45/00

Abstract:
Some embodiments include memory structures having a diode over a memory cell. The memory cell can include programmable material between a pair of electrodes, with the programmable material containing a multivalent metal oxide directly against a high-k dielectric. The diode can include a first diode electrode directly over one of the memory cell electrodes and electrically coupled with the memory cell electrode, and can include a second diode electrode laterally outward of the first diode electrode and not directly over the memory cell. Some embodiments include memory arrays comprising the memory structures, and some embodiments include methods of making the memory structures.
Public/Granted literature
- US20160005968A1 Memory Structures and Arrays, and Methods of Forming Memory Structures and Arrays Public/Granted day:2016-01-07
Information query
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