Invention Grant
- Patent Title: Method for fabricating fluid ejection device
- Patent Title (中): 制造流体喷射装置的方法
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Application No.: US13097549Application Date: 2011-04-29
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Publication No.: US09403365B2Publication Date: 2016-08-02
- Inventor: David Bernard , Andrew Mcnees , James Mrvos
- Applicant: David Bernard , Andrew Mcnees , James Mrvos
- Applicant Address: JP
- Assignee: FUNAI ELECTRIC CO., LTD.
- Current Assignee: FUNAI ELECTRIC CO., LTD.
- Current Assignee Address: JP
- Agency: Amster, Rothstein Ebenstein LLP
- Main IPC: B41J2/16
- IPC: B41J2/16 ; H01L21/265

Abstract:
A method for fabricating a fluid ejection device includes forming a drive circuitry layer on a substrate, fabricating at least one fluid ejection element on a top portion of the substrate, grinding the substrate from a bottom portion of the substrate up to a predetermined height, etching the top portion of the substrate to configure at least one slot within the top portion of the substrate, depositing a layer of an etch-stop material over the top portion of the substrate while filling the at least one slot with the etch-stop material, etching the bottom portion of the substrate to configure at least one fluid feed trench within the bottom portion of the substrate, removing the layer of the etch-stop material from the top portion of the substrate, and laminating a flow feature layer and a nozzle plate as a single unit over the top portion of the substrate.
Public/Granted literature
- US20120273597A1 METHOD FOR FABRICATING FLUID EJECTION DEVICE Public/Granted day:2012-11-01
Information query
IPC分类: