Invention Grant
- Patent Title: Press felt base fabric exhibiting reduced interference
- Patent Title (中): 压榨毡基织物表现出减小的干扰
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Application No.: US14766234Application Date: 2014-02-06
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Publication No.: US09404218B2Publication Date: 2016-08-02
- Inventor: Hanjiang Xu , Robert W. Huck , Daniel N. Hedou
- Applicant: AstenJohnson, Inc.
- Applicant Address: US SC Charleston
- Assignee: AstenJohnson, Inc.
- Current Assignee: AstenJohnson, Inc.
- Current Assignee Address: US SC Charleston
- Agency: Volpe and Koenig, P.C.
- International Application: PCT/US2014/015054 WO 20140206
- International Announcement: WO2014/124111 WO 20140814
- Main IPC: D21F7/08
- IPC: D21F7/08 ; D03D13/00 ; D03D15/00 ; B32B5/06 ; B32B5/26 ; D21F1/00

Abstract:
A press felt formed of two stacked layers of woven single layer base fabric, each layer being formed by warp yarns interwoven with two systems of weft yarns according to a single layer weave pattern. The layers are needled with a batt layer. In the woven single layer base fabric: a) the warp yarns are polymeric monofilaments arranged as a single layer and there are two systems of weft yarns; b) the first system of weft yarns are formed by cabled polymeric monofilaments and the second system of well yarns are single polymeric monofilaments; c) the cabled polymeric monofilaments are 50% to 85% in one repeat; d) the cabled monofilaments are each formed of at least two monofilaments which are cabled together; and e) at least two of the cabled well yarns in each repeat are adjacent to each other.
Public/Granted literature
- US20150368863A1 PRESS FELT BASE FABRIC EXHIBITING REDUCED INTERFERENCE Public/Granted day:2015-12-24
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