Invention Grant
- Patent Title: Flow-affecting device
- Patent Title (中): 流量影响装置
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Application No.: US13704000Application Date: 2011-12-21
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Publication No.: US09404339B2Publication Date: 2016-08-02
- Inventor: Jason D. Dykstra , Michael Linley Fripp
- Applicant: Jason D. Dykstra , Michael Linley Fripp
- Applicant Address: US TX Houston
- Assignee: Halliburton Energy Services, Inc.
- Current Assignee: Halliburton Energy Services, Inc.
- Current Assignee Address: US TX Houston
- Agency: Kilpatrick Townsend & Stockton LLP
- International Application: PCT/US2011/066424 WO 20111221
- International Announcement: WO2013/095423 WO 20130627
- Main IPC: E21B34/06
- IPC: E21B34/06 ; E21B34/08

Abstract:
Fluid flow influencer devices in chambers subsequent to vortex assemblies are described. A flow-affecting device can move from a first position to a second position based on a flow path of fluid flowing from the vortex assembly to the chamber. The flow path may depend on an amount of rotation of the fluid from the vortex assembly. The flow-affecting device in the first position can substantially allow fluid to flow through a chamber exit opening. The flow-affecting device in the second position can substantially restrict fluid from flowing through the chamber exit opening.
Public/Granted literature
- US20130160990A1 FLOW-AFFECTING DEVICE Public/Granted day:2013-06-27
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