Invention Grant
- Patent Title: Integrated metal grating
- Patent Title (中): 集成金属光栅
-
Application No.: US13915300Application Date: 2013-06-11
-
Publication No.: US09405063B2Publication Date: 2016-08-02
- Inventor: Jui Hsieh Lai , Tien-I Bao , Hai-Ching Chen , Ying-Hao Kuo
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: G02B6/124
- IPC: G02B6/124 ; G02B6/34 ; G02B6/12 ; H01L31/0203 ; G02B6/42

Abstract:
An integrated circuit includes a substrate, a metal grating disposed over the substrate, and a waveguide layer disposed over or under the metal grating. The metal grating is arranged to change a propagation direction of an optical signal and the waveguide layer is arranged to guide the optical signal to a desired direction.
Public/Granted literature
- US20140363121A1 Integrated Metal Grating Public/Granted day:2014-12-11
Information query