Invention Grant
- Patent Title: Salt, acid generator and resist composition
- Patent Title (中): 盐,酸发生剂和抗蚀剂组成
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Application No.: US13170990Application Date: 2011-06-28
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Publication No.: US09405187B2Publication Date: 2016-08-02
- Inventor: Takashi Hiraoka , Hiromu Sakamoto , Koji Ichikawa
- Applicant: Takashi Hiraoka , Hiromu Sakamoto , Koji Ichikawa
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-147211 20100629
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07D207/12 ; C07D211/46 ; C07D233/60 ; C07D307/77 ; C07D327/08 ; G03F7/039

Abstract:
The present invention is a salt represented by the formula (I) wherein R1 and R2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; L1 represents a C1 to C17 divalent saturated hydrocarbon group, a —CH2— contained in the saturated hydrocarbon group may be replaced by —O— or —CO—; ring W1 represents a C2 to C36 heterocycle; R3 represents a hydrogen atom or a C1 to C12 hydrocarbon group, a —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—; R4 in each occurrence independently represent a C1 to C6 hydrocarbon group, a —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—; m represents an integer of 0 to 6; and Z+ represents an organic cation.
Public/Granted literature
- US20110318688A1 SALT, ACID GENERATOR AND RESIST COMPOSITION Public/Granted day:2011-12-29
Information query
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