Invention Grant
- Patent Title: Apparatus and method for cleaning substrate
- Patent Title (中): 清洗基板的装置及方法
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Application No.: US13905634Application Date: 2013-05-30
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Publication No.: US09406501B2Publication Date: 2016-08-02
- Inventor: Yong Hee Lee , Bok Kyu Lee , Jongsu Choi
- Applicant: Semes Co., Ltd.
- Applicant Address: KR Chungcheongnam-Do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-Do
- Agency: Harness, Dickey & Pierce, PLC
- Priority: KR10-2012-0058519 20120531; KR10-2012-0082656 20120727
- Main IPC: B08B3/00
- IPC: B08B3/00 ; H01L21/02 ; H01L21/67

Abstract:
Provided are an apparatus and a method of cleaning a substrate. The apparatus includes a substrate supporting unit supporting a substrate, a container surrounding the substrate supporting unit and collecting an organic solvent scattered from the substrate, and a fluid supplying unit provided on one side of the container and spraying a liquid organic solvent with bubbles to the substrate. The fluid supplying unit includes a nozzle head ejecting the organic solvent to the substrate, an organic solvent supplying line supplying the organic solvent from an organic solvent storage tank to the nozzle head, and a bubble providing element provided on the organic solvent supplying line and providing bubbles to the liquid organic solvent.
Public/Granted literature
- US20130319457A1 APPARATUS AND METHOD FOR CLEANING SUBSTRATE Public/Granted day:2013-12-05
Information query