Invention Grant
US09406531B1 Integrated circuit packaging system with photoimagable dielectric-defined trace and method of manufacture thereof 有权
具有光可光刻介质定义痕迹的集成电路封装系统及其制造方法

Integrated circuit packaging system with photoimagable dielectric-defined trace and method of manufacture thereof
Abstract:
A system and method of manufacture of an integrated circuit packaging system includes: a photoimagable dielectric layer having a trace opening for exposing the carrier; a trace within the trace opening; an inner solder resist layer directly on the photoimagable dielectric layer and the trace, the inner solder resist layer having a bond pad opening for exposing the trace; an integrated circuit over the inner solder resist layer, the integrated circuit electrically connected to the trace through the bond pad opening; an encapsulation directly on the integrated circuit and the inner solder resist layer; and an external interconnect electrically coupled to the trace and the integrated circuit.
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