Invention Grant
- Patent Title: Integrated circuit packaging system with photoimagable dielectric-defined trace and method of manufacture thereof
- Patent Title (中): 具有光可光刻介质定义痕迹的集成电路封装系统及其制造方法
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Application No.: US14229280Application Date: 2014-03-28
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Publication No.: US09406531B1Publication Date: 2016-08-02
- Inventor: Zigmund Ramirez Camacho , Bartholomew Liao Chung Foh , Sheila Marie L. Alvarez , Dao Nguyen Phu Cuong , HeeJo Chi
- Applicant: Zigmund Ramirez Camacho , Bartholomew Liao Chung Foh , Sheila Marie L. Alvarez , Dao Nguyen Phu Cuong , HeeJo Chi
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Wong & Rees LLP
- Main IPC: H01L23/485
- IPC: H01L23/485 ; H01L21/48 ; H01L23/12 ; H01L21/56 ; H01L23/00

Abstract:
A system and method of manufacture of an integrated circuit packaging system includes: a photoimagable dielectric layer having a trace opening for exposing the carrier; a trace within the trace opening; an inner solder resist layer directly on the photoimagable dielectric layer and the trace, the inner solder resist layer having a bond pad opening for exposing the trace; an integrated circuit over the inner solder resist layer, the integrated circuit electrically connected to the trace through the bond pad opening; an encapsulation directly on the integrated circuit and the inner solder resist layer; and an external interconnect electrically coupled to the trace and the integrated circuit.
Information query
IPC分类: