Invention Grant
- Patent Title: Substrate transfer apparatus
- Patent Title (中): 基板转印装置
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Application No.: US14091639Application Date: 2013-11-27
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Publication No.: US09406539B2Publication Date: 2016-08-02
- Inventor: Tsutomu Hiroki
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Cantor Colburn LLP
- Priority: JP2010-024283 20100205
- Main IPC: B25J15/00
- IPC: B25J15/00 ; H01L21/683 ; B65G49/06 ; H01L21/677 ; H01L21/687

Abstract:
In the substrate holder, while holding a periphery portion of a semiconductor wafer, some of protruding portions having a grass shape on a pad main body hide beneath the semiconductor wafer, and the others of the protruding portions are exposed outside the semiconductor wafer. Also, the protruding portions hiding beneath the semiconductor wafer contact a rear surface of the semiconductor wafer, and sink the semiconductor wafer to a suitable depth via gravity, thereby holding the semiconductor wafer mainly in a length direction. In addition, some of protruding portions exposed near the periphery portion of the semiconductor wafer contact a side surface of the semiconductor wafer, thereby holding the semiconductor wafer mainly in a width direction.
Public/Granted literature
- US20140093336A1 SUBSTRATE TRANSFER APPARATUS Public/Granted day:2014-04-03
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