Invention Grant
- Patent Title: Embedded component device and manufacturing methods thereof
- Patent Title (中): 嵌入式组件设备及其制造方法
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Application No.: US12972046Application Date: 2010-12-17
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Publication No.: US09406658B2Publication Date: 2016-08-02
- Inventor: Chun-Che Lee , Yuan-Chang Su , Ming Chiang Lee , Shih-Fu Huang
- Applicant: Chun-Che Lee , Yuan-Chang Su , Ming Chiang Lee , Shih-Fu Huang
- Applicant Address: TW Kaosiung
- Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
- Current Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
- Current Assignee Address: TW Kaosiung
- Agency: Foley & Lardner LLP
- Agent Cliff Z. Liu; Angela D. Murch
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L23/52 ; H01L23/48 ; H01L25/16 ; H01L23/538 ; H01L23/00

Abstract:
An embedded component device includes an electronic component including an electrical contact, an upper patterned conductive layer, a dielectric layer between the upper patterned conductive layer and the electronic component, a first electrical interconnect, a lower patterned conductive layer, a conductive via, and a second electrical interconnect. The dielectric layer has a first opening exposing the electrical contact, and a second opening extending from the lower patterned conductive layer to the upper patterned conductive layer. The first electrical interconnect extends from the electrical contact to the upper patterned conductive layer, and fills the first opening. The second opening has an upper portion exposing the upper patterned conductive layer and a lower portion exposing the lower patterned conductive layer. The conductive via is located at the lower portion of the second opening. The second electrical interconnect fills the upper portion of the second opening.
Public/Granted literature
- US20120153493A1 EMBEDDED COMPONENT DEVICE AND MANUFACTURING METHODS THEREOF Public/Granted day:2012-06-21
Information query
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