Invention Grant
- Patent Title: Polishing coated substrates
- Patent Title (中): 抛光涂层基材
-
Application No.: US13261646Application Date: 2011-10-27
-
Publication No.: US09406822B2Publication Date: 2016-08-02
- Inventor: David Lawrence Bamber , Paul David Warren , Troy Darrell Manning , Neil McSporran , Paul Arthur Holmes
- Applicant: David Lawrence Bamber , Paul David Warren , Troy Darrell Manning , Neil McSporran , Paul Arthur Holmes
- Applicant Address: GB Lathom
- Assignee: Pilkington Group Limited
- Current Assignee: Pilkington Group Limited
- Current Assignee Address: GB Lathom
- Agency: Marshall & Melhorn, LLC
- Priority: GB1018141.0 20101027
- International Application: PCT/GB2011/052087 WO 20111027
- International Announcement: WO2012/056240 WO 20120503
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/0236 ; H01L31/0392 ; H01L31/18 ; H01L51/00 ; H01L51/44 ; H01L21/02 ; H01L33/22

Abstract:
A process for the production of an optoelectronic device, such as a photovoltaic cell or a light emitting diode is disclosed. The process comprises providing a substrate having a conductive coating on at least one surface, the conductive coating having an initial roughness and at least one or more spikes, and applying a functional component to the coated surface of the substrate. The surface of the substrate having the conductive coating has been subjected to a polishing step using at least one brush to reduce the height of the spikes inherent to the conductive coating and to give the conductive coating a final roughness. By reducing the spikes there is less potential for the optoelectronic device to suffer from electrical shunts which reduce the efficiency of the device.
Public/Granted literature
- US20130244359A1 POLISHING COATED SUBSTRATES Public/Granted day:2013-09-19
Information query
IPC分类: