Invention Grant
- Patent Title: Method of making diode having reflective layer
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Application No.: US14294732Application Date: 2014-06-03
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Publication No.: US09406837B2Publication Date: 2016-08-02
- Inventor: Myung Cheol Yoo
- Applicant: LG Innotek Co. Ltd.
- Applicant Address: KR Seoul
- Assignee: LG INNOTEK CO., LTD
- Current Assignee: LG INNOTEK CO., LTD
- Current Assignee Address: KR Seoul
- Agency: Dentons US LLP
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/46 ; H01L33/06 ; H01L33/60 ; H01L33/32 ; H01L33/42

Abstract:
A method of forming a light emitting diode includes forming a transparent substrate and a GaN buffer layer on the transparent substrate. An n-GaN layer is formed on the buffer layer. An active layer is formed on the n-GaN layer. A p-GaN layer is formed on the active layer. A p-electrode is formed on the p-GaN layer and an n-electrode is formed on the n-GaN layer. A reflective layer is formed on a second side of the transparent substrate. A scribe line is formed on the substrate for separating the diodes on the substrate. Also, a cladding layer of AlGaN is between the p-GaN layer and the active layer.
Public/Granted literature
- US20140273322A1 METHOD OF MAKING DIODE HAVING REFLECTIVE LAYER Public/Granted day:2014-09-18
Information query
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